INSPIRE FORM

Inspire Form is a complete stamping simulation tool that allows product designers and process engineers to simulate the stamping process thus helping to identify defects before manufacture reducing costs. 

See the product benefits and use cases below to find out more. Contact us for a demo or a free trial.

Altair Inspire Cast
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IMPROVE QUALITY

Improve quality of stamped parts by identifying and eliminating defects 

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FAST ONBOARDING

Get up to speed fast within a couple of hours giving you a fast ROI

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COLLABORATE

The only tool that caters for beginners and experts alike

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REDUCE ERRORS

By easily visualising common stamping defects such as thinning, splits and springback

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Modules

Feasibility and virtual die tryout module 

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REDUCE COST 

Upfront early simulation allows to minimise waste material and improve yields

Inspire Form

Inspire Form
Altair Inspire Form -  Feasibility Analysis and Blank Layout Analysis

Altair Inspire Form - Feasibility Analysis and Blank Layout Analysis

10:17
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Altair Inspire Form   Tryout Analysis, Multi stage forming operation

Altair Inspire Form Tryout Analysis, Multi stage forming operation

10:15
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Fast, Easy, Accurate & Affordable Forming Simulation from Altair

Fast, Easy, Accurate & Affordable Forming Simulation from Altair

01:00:59
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PRODUCT BENEFITS

Geometry

  • Extract Midsurfaces

  • Fill holes and cutouts

  • Remove Flanges

  • Create and modify geometry

  • Save out blanks and nested parts as IGES

Early Simulation

  • Avoid Iterations between design and production

  • Avoid costly defects; thinning, splits, spring back

  • Multi Stage Forming

  • Accurate Blank Shape and Nesting

  • Save material to reduce costs

Easy to Use

  • No need to be a software or foundry expert

  • Minimal Training - 1 Day max

  • Import most common data formats

  • Intuitive interface 

Components & Materials

  • Large database of materials 

  • Ability to create own custom materials

  • If no die/tool has been modelled Inspire form will allow you to create the die itself.